factory customized Atomic Layer Deposition System - Vacuum Lab Furnace – ShuangLing
factory customized Atomic Layer Deposition System - Vacuum Lab Furnace – ShuangLing Detail:
1. Application
It is mainly used for sintering experiment and melting experiment for various metals, polysilicon ingot casting, nonmetal materials in high or super higher temperature.
2. Function
2.1. Sintering and melt material under vacuum or atmosphere situation under 3000℃.
2.2. Temperature can be adjusted and be kept at constant temperature.
3. Specifications
Work temperature | 1600 -2200℃±10℃ |
Max temperature | 2800℃ |
Temperature uniformity | ≤±20℃(2200℃) |
Ultimate vacuum | according to technological requirements |
Press rising rate | 3Pa/h |
Wokspace size | Φ100mm~Φ600mm×H450mm( according to user’s requirement) |
Product detail pictures:

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Product quality is good, quality assurance system is complete, every link can inquire and solve the problem timely!

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