High definition Atomic Layer Deposition Cvd System - Vacuum Gas Atomization Equipment – ShuangLing
High definition Atomic Layer Deposition Cvd System - Vacuum Gas Atomization Equipment – ShuangLing Detail:
1. Equipment application
This equipment is mainly used for metal or metal alloy melting in vacuum and then atomization in atomization chamber under the gas protection environment to produce metal powder or metal granule.
The vacuum type gas atomization equipment is used for production the metal powder with high control requirement of oxygen content increment, at the same time, it own all powder production functions of antivacuum gas atomization equipments.
2. Equipment capacity
30KG-1000KG/batch for choose.
3. Equipment cover area
Length*Width*Height: 6M*7M*7-12M.
Product detail pictures:



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Our well-equipped facilities and great good quality regulate throughout all stages of manufacturing enables us to guarantee total buyer gratification for High definition Atomic Layer Deposition Cvd System - Vacuum Gas Atomization Equipment – ShuangLing , The product will supply to all over the world, such as: Lesotho , Pretoria , Bolivia , We are proud to supply our products to every costumer all around the world with our flexible, fast efficient services and strictest quality control standard which has always approved and praised by customers.

The factory technical staff gave us a lot of good advice in the cooperation process, this is very good, we are very grateful.

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