High definition Atomic Layer Deposition Cvd System - Vacuum Gas Atomization Equipment – ShuangLing
High definition Atomic Layer Deposition Cvd System - Vacuum Gas Atomization Equipment – ShuangLing Detail:
1. Equipment application
This equipment is mainly used for metal or metal alloy melting in vacuum and then atomization in atomization chamber under the gas protection environment to produce metal powder or metal granule.
The vacuum type gas atomization equipment is used for production the metal powder with high control requirement of oxygen content increment, at the same time, it own all powder production functions of antivacuum gas atomization equipments.
2. Equipment capacity
30KG-1000KG/batch for choose.
3. Equipment cover area
Length*Width*Height: 6M*7M*7-12M.
Product detail pictures:
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The really abundant projects management experiences and 1 to just one provider model make the high importance of business enterprise communication and our easy understanding of your expectations for High definition Atomic Layer Deposition Cvd System - Vacuum Gas Atomization Equipment – ShuangLing , The product will supply to all over the world, such as: Melbourne , Ghana , Cape Town , Today, We are with great passion and sincerity to further fulfill our global customers' needs with good quality and design innovation. We fully welcome customers from all over the world to establish stable and mutually beneficial business relationships, to have a bright future together.
By Julia from Bangladesh - 2017.04.28 15:45
We always believe that the details decides the company's product quality, in this respect, the company conform our requirements and the goods are meet our expectations.
By Lauren from Bahrain - 2018.12.22 12:52
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