High definition Atomic Layer Deposition Cvd System - Vacuum Gas Atomization Equipment – ShuangLing
High definition Atomic Layer Deposition Cvd System - Vacuum Gas Atomization Equipment – ShuangLing Detail:
1. Equipment application
This equipment is mainly used for metal or metal alloy melting in vacuum and then atomization in atomization chamber under the gas protection environment to produce metal powder or metal granule.
The vacuum type gas atomization equipment is used for production the metal powder with high control requirement of oxygen content increment, at the same time, it own all powder production functions of antivacuum gas atomization equipments.
2. Equipment capacity
30KG-1000KG/batch for choose.
3. Equipment cover area
Length*Width*Height: 6M*7M*7-12M.
Product detail pictures:
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Vacuum Gas Atomization Equipment – ShuangLing detail pictures"
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We depend on sturdy technical force and continually create sophisticated technologies to meet the demand of High definition Atomic Layer Deposition Cvd System - Vacuum Gas Atomization Equipment – ShuangLing , The product will supply to all over the world, such as: Bahamas , Mexico , Mali , Our focus on product quality, innovation, technology and customer service has made us one of undisputed leaders worldwide in the field. Bearing the concept of "Quality First, Customer Paramount, Sincerity and Innovation" in our mind, We have achieved great progress in the past years. Clients are welcomed to buy our standard products, or send us requests. You will be impressed by our quality and price. Please contact us now!
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The goods are very perfect and the company sales manager is warmful, we will come to this company to purchase next time.
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